Optical properties and structure of HfO2 thin films grown by high pressure reactive sputtering
MetadataShow full item record
AuthorMartínez Viviente, Félix Lorenzo; Toledano Luque, María; Gandía Alabau, José Javier; Cárabe López, Julio; Bohne, Wolfgang; [et al.]
Bibliographic CitationMartínez Viviente, Félix Lorenzo. Optical properties and structure of HfO2 thin films grown by high pressure reactive sputtering. Journal of Physics D: Applied Physics, 40 (17): 5256-5265, agosto 2007. ISSN 0022-3727
Thin films of hafnium oxide have been grown by high pressure reactive sputtering on transparent quartz substrates (UV-grade silica) and silicon wafers. Deposition conditions were adjusted to obtain as well as amorphous films. Optical properties of the films deposited on the silica substrates were investigated by transmittance and reflectance spectroscopy in the ultraviolet, visible and near infrared range (UV-VIS-NIR). A numerical analysis method that takes into account the different surface roughness of the polycrystalline and amorphous films was applied to calculate the optical constants (refractive index and absorption coefficient). Amorphous films were found to have a higher refractive index and a lower transparency than polycrystalline films. This is attributed to a higher density of the amorphous samples, which was confirmed by atomic density measurements performed by heavy-ion elastic recoil detection analysis (ERDA). The absorption coefficient gave an excellent fit to the Tauc ...
- Artículos 
The following license files are associated with this item: